RESEARCH OF STRUCTURE AND COMPOSITION OF FILMS SOLID SOLUTION (SIC)1-X (ALN)X, RECEIVED BY METHOD MAGNETRON DEPOSITION
https://doi.org/10.21822/2073-6185-2015-38-3-15-20
Abstract
Method of magnetron sputtering targets polycrystalline SiC-AlN on substrates SiC and Al2O3 thin films received solid solutions (SiC)1-x(AlN)x. The methods of Xray and electron microscopy studies the structure and composition of films. There are factors that determine the composition and structure of films, as well as conditions for the formation of monocrystalline films of (SiC)1-x(AlN)x to the substrate SiC. The basic technological parameters of process magnetron sedimentation of films (SiC)1-x(AlN)x are calculated.
About the Authors
B. A. Bilalov
ФГБОУ ВО «Дагестанский государственный технический университет», г. Махачкала
Russian Federation
Russian Federation
M. K. Gusejnov
ФГБОУ ВО «Дагестанский государственный технический университет», г. Махачкала
Russian Federation
Russian Federation
G. K. Safaraliev
НИИ «Микроэлектроники и нанотехнологий», ФГБОУ ВО «Дагестанский государственный технический университет», г. Махачкала
Russian Federation
Russian Federation
References
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Review
For citations:
Bilalov B.A., Gusejnov M.K., Safaraliev G.K. RESEARCH OF STRUCTURE AND COMPOSITION OF FILMS SOLID SOLUTION (SIC)1-X (ALN)X, RECEIVED BY METHOD MAGNETRON DEPOSITION. Herald of Dagestan State Technical University. Technical Sciences. 2015;38(3):15-20. (In Russ.) https://doi.org/10.21822/2073-6185-2015-38-3-15-20
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